Research Facilities

Eqipment Name : Co-evaporation System/ DST
Specification : Maximum temp of the effusion cell 1200°C. We can deposite Zn, Ga,In, S and Se.
Funded by : DST
Eqipment Name : DC sputtering system/ MNRE
Specification : It consists of three guns. 3 inch target used in the two gun and in one gun we can use 2 inch target. We can deposit metal and semiconductor material using 3 inch and 2 inch target.
Funded by : MNRE
Eqipment Name : RF Sputtering system/ MNRE
Specification : It consists of 3 gun. In each gun we can 2 inch target of metal, extrinsic and intrinsic scmiconductor material.
Funded by : MNRE
Eqipment Name : X-ray Diffraction unit/ DST
Specification : It consists of (2 kW, NF, Cu tube) Graphite monochromator (CM-3121) 2θ=10°-80° λ= 1.45Å X-ray incident angle 1°,2°,5° and 10° Scan speed as per requirement.
Funded by : DST
Eqipment Name : UV-VIS spectrophotometer/ MNRE
Specification : Measurement Wavelength Range 300nm to 900nm. We can measure absorbance, reflectance and transmittance.
Funded by : MNRE
Eqipment Name : Hall Effect Measurement/ DRDO
Specification : We can measure electrical(carrier conc.,mobility, resistivity and hall coefficient e.t.c) properties of the film at room temperature or in the presence liquid Nitrogen . Sample size should be 1cm×1cm.
Funded by : DRDO
Eqipment Name : EDXRF/ MNRE
Specification : Composition can be measure in the presence of air and below 24°C of the film, powder and liquid sample. We can also measure the thickness of the film sample. We can also use different spot size for the measurement.
Funded by : MNRE
Eqipment Name : RTP Furnace (3 nos.)/ DRDO/MNRE
Specification : The film is Annealed in the vacuum or gaseous environment. The maximum temperature up to 1000° C We can also annealed the film in different step.
Funded by : MNRE
Eqipment Name : RTP Furnace (3 nos.)/ DRDO/MNRE
Specification : The film is Annealed in the vacuum or gaseous environment. The maximum temperature up to 1000° C We can also annealed the film in different step.
Funded by : MNRE
Eqipment Name : RTP Furnace (3 nos.)/ DRDO/MNRE
Specification : The film is Annealed in the vacuum or gaseous environment. The maximum temperature up to 1000° C We can also annealed the film in different step.
Funded by : MNRE
Eqipment Name : Current-voltage measurement setup /MNRE
Specification : We can measure I-V characteristics two and 3 terminal devices. Maximum voltage range = -10V to 10 V Operating temperature 23°±5° C Humidity ≤70
Funded by : MNRE
Eqipment Name : Impedance Analyzers/ LCR Meter
Specification : * Frequency range 10µHz to 1MHz * Floating differential inputs – 100 Vpk * Gain accuracy at < 1 kHz 0.02 dB * Phase accuracy at < 1 kHz 0.02°
Funded by : MNRE
Eqipment Name : Impedance Analyzers/ LCR Meter
Specification : * Frequency range 10µHz to 1MHz * Floating differential inputs – 100 Vpk * Gain accuracy at < 1 kHz 0.02 dB * Phase accuracy at < 1 kHz 0.02°
Funded by : MNRE
Eqipment Name : Thermal Evaporation System/ DST
Specification : It consists of helical boat. For the deposition, we can use pallets of the material.
Funded by : DST
Eqipment Name : Spin Coating System/DST
Specification : Very High Speed Range: 100 -10,000 Rotations per minute Very High Acceleration: 40- 5,000 Rotations per minute High Duration Range: 1- 9,999 seconds per step Less than 1 percent error across full speed range
Funded by : DST
Eqipment Name : Fume Hood
Specification : We can use for chemical bath deposition
Funded by :
Eqipment Name : Ball Milling
Specification : *Special grinding force due to a rotational speed up to 650 U/min *Loss-free grinding even below 1 μm * Working station with easily adjustable imbalance compensation Safe tensioning of the bowls with the Safe-Lock-System *Useful capacity up to 225 ml
Funded by :
Eqipment Name : Spray Pyrolysis unit with Substrate heating arrangement
Specification :
Funded by :
Eqipment Name : Thickness Measurement
Specification : Thickness range: 15nm-70µm Wavelengt: 380-1050nm
Funded by :